MEA Vacuum Pumps; Used To Remove Air or Gas Molecules to Creating A Vacuum
MEA vacuum pumps are used to remove air or any gas particles from the container that creates vacuum in the vessel. The first vacuum pump was invented in 1650 by Otto von Guericke. Vacuum components or technologies are of three types, such as vacuum hardware, vacuum instrumentation, and vacuum pumps. Vacuum pumps are extensively used in various end-use industries, such as oil and gas, electronics, semiconductor, chemical processing, power, etc. They are used in electronics manufacturing facilities to produce semiconducting materials, electric bulbs and lamps, CRT tubes, etc.
MEA vacuum pumps provide high ultimate vacuum and high speed
evacuation, and are widely adopted in various applications due to its
versatility. Moreover, technological advancements, such as capability, easy
integration, low level of vibration and noise, light weight, and compact
design, are enhancing the adoption rate of vacuum pumps in various fields.
There is growing demand for dry vacuum pump, as they produce low level of
vibration & noise and are compact in size compared to oil lubricated pump.
Thus, there is an increasing demand for dry vacuum pump in both pharmaceutical
and chemical industries.
Moreover, with the increasing investments in end-user
industries, such as power generation, chemical, and oil and gas, as a result of
increased natural gas production, the demand for MEA vacuum pumps is also
increasing. Energy production in the United States is growing rapidly. For
instance, ExxonMobil planned to produce more than 1 million oil-equivalent
barrels per day (bpd) by as early as 2024. Furthermore, in 2019, the United
States Department of Energy (DOE) allotted around US$ 26.1 million to advance
the marine and hydrokinetics industry and increase hydropower's ability to
serve a flexible grid resource.
Different vacuum pumps have different pressure range, such
as vacuum pressure for research and development (R&D) activities,
instrumentation manufacturer’s pressure range, thin-film deposition
(non-Semiconductor), semiconductor process vacuum, industrial vacuum, process
vacuum, and the rough vacuum.
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